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Optical proximity correction on attenuated phase-shifting photo mask for dense contact array

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.209264

Authors: Yongkyoo Choi, Young Jin Song, Hong-Seok Kim, Woo S. Kim

Institution: LG (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017062889

FWCI:

Cites: 2

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Related to: 10