Work

Immersion and dry scanner extensions for sub-10nm production nodes

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2087112

Authors: Stefan Weichselbaum, Frank Bornebroek, Toine de Kort, Richard Droste, Roelof F. de Graaf, Rob van Ballegoij, Herman Botter, Matthew G. McLaren, Wim P. de Boeij

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2017186164

FWCI: 2.498

Cites: 13

Cited by: 8

Related to: 10