Minority-carrier lifetime and defect content of n-type silicon grown by the noncontact crucible method
Year: 2014
Type: article
Source: Journal of Crystal Growth
Institutions: Massachusetts Institute of Technology, Kyoto University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
Awards: G426311843, G78394265, G825080086
OpenAlex ID: W2017246168
