Exploration of the ultimate patterning potential achievable with focused ion beams
Year: 2008
Type: article
Source: Ultramicroscopy
Authors: J. Gierak, E. Bourhis, G. Faini, G. Patriarche, A. Madouri, R. Jede, L. Bruchhaus, S. Bauerdick, B. Schiedt, A.L. Biance, L. Auvray
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2017329692