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Growth Mode and Threading Dislocation Behavior of GaN Films Grown on Patterned Sapphire Substrate with Radial Stripe Pattern

Year: 2013
Type: article
Abstract: A sapphire substrate with a grooved stripe pattern along different radial directions was prepared to investigate the effects of stripe direction on the growth mode and threading dislocation (TD) behavior of GaN films. When the stripe direction is oriented parallel to [101̄0]sapphire, the GaN films have a triangular structure that is formed by the GaN{101̄1} facets. As the stripe direction rotates from [101̄0]sapphire, nanosteps with a step height of around 80 nm are formed on the GaN{101̄1} facets and then the coalescence of GaN on the ridges and grooves advances. GaN films with a smooth surface and a TD density as low as 2.0×108 cm-2 were achieved when the stripe direction was rotated 3° from [101̄0]sapphire. Our result indicates that the surface roughness and TD density of GaN films can be controlled by precisely adjusting the angle of the stripe direction from [101̄0]sapphire.
Institution: Nagoya University
Language: English
Open Access status: bronze
OpenAlex ID: W2017883544
FWCI:
Cites: 20
Cited by: 4
Related to: 10