Work

Interfaces analysis of the HfO2/SiO2/Si structure

Year: 2010

Type: article

Source: Journal of Physics and Chemistry of Solids

DOI: 10.1016/j.jpcs.2010.02.010

Authors: T.P. Smirnova, L.V. Yakovkina, S.A. Beloshapkin, V.V. Kaichev, N.I. Alferova, Song Jeong-Hwan

Institutions: Siberian Branch of the Russian Academy of Sciences, Nikolaev Institute of Inorganic Chemistry, University of Limerick, Boreskov Institute of Catalysis, Pai Chai University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Siberian Branch, Russian Academy of Sciences

OpenAlex ID: W2018378182

FWCI: 0.953

Cites: 16

Cited by: 20

Related to: 10