Ion beam lithography for direct patterning of high accuracy large area X-ray elements in gold on membranes
Year: 2012
Type: article
Source: Microelectronic Engineering
Authors: A. Nadzeyka, L. Peto, S. Bauerdick, M. Mayer, K. Keskinbora, C. Grévent, M. Weigand, M. Hirscher, G. Schütz
Institutions: Raith (Germany), Max Planck Institute for Intelligent Systems
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2018486397