Work

Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water

Year: 1995

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.113115

Authors: Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase

Institution: NTT (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2018539320

FWCI: 0.926

Cites: 2

Cited by: 127

Related to: 10