Work

Deposition of Bismuth Telluride Thick Film by Solidification under Centrifugal Pressure

Year: 2009

Type: article

Source: Journal of Electronic Materials

DOI: 10.1007/s11664-008-0640-z

Authors: Yoshiaki Kinemuchi, Tomohiro Aoki, Hisashi Kaga, Kumi Okanoue, Hirohide Ishiguro, Koji Watari

Institutions: National Institute of Advanced Industrial Science and Technology, Sinto (Japan)

Language: English

Topic: Advanced Thermoelectric Materials and Devices

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2018630845

FWCI:

Cites: 9

Cited by: 5

Related to: 10