Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method
Year: 2005
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.2150250
Authors: Youngdo Won, Sangwook Park, Jaehyoung Koo, Seokhoon Kim, Jinwoo Kim, Hyeongtag Jeon
Institution: Hanyang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2018783167