Work

Evaluation of SCAA mask technology as a pathway to the 65-nm node

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.485413

Authors: James V. Beach, John S. Petersen, Mark J. Maslow, David J. Gerold, Diane C. McCafferty

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2018864697

FWCI: 0.449

Cites: 3

Cited by: 1

Related to: 10