Work

Fast annealing of 4 in. arsenic-implanted silicon wafers using an imaging furnace

Year: 1982

Type: article

Source: Electronics Letters

DOI: 10.1049/el:19820472

Authors: M. Haond, D.-P. Vu, C. Adès

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2019924154

FWCI: 0.554

Cites: 8

Cited by: 2

Related to: 10