Effects of inductively coupled plasma oxidation on the properties of polycrystalline silicon films and thin film transistors
Year: 1999
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.123939
Authors: Yong Woo Choi, Sang Won Park, Byung Tae Ahn
Institution: Korea Advanced Institute of Science and Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2020162930