Work

Advanced plasma technology for large scale PECVD processes

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.930427

Authors: J. Landrock, M. Zeuner, M. Nestler, D. Rost

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2020229502

FWCI: 0.406

Cites:

Cited by: 2

Related to: 10