Improved Aluminum Nitride Thin Films Grown By Mocvd From Tritertiarybutylaluminum And Ammonia
Year: 1996
Type: article
Source: MRS Proceedings
DOI: 10.1557/proc-423-323
Authors: T. Metzger, E. Born, R. Stimmer, W. Rieger, R. Dimitrov, D. Lentz, H. Angerer, O. Ambacher, M. Stutzmann
Institutions: Technical University of Munich, Siemens (Germany)
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2020952708
