Work

Feasibility study of resist slimming for SIT

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2011506

Authors: Nicole Saulnier, Chiew-seng Koay, Matthew Colburn, David Hetzer, Michael Cicoria, Jonathan Ludwicki

Institutions: IBM (United States), Tokyo Electron (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2020990739

FWCI: 1.222

Cites: 2

Cited by: 3

Related to: 10