Work

An XPS depth-profile study on electrochemically deposited TaO x

Year: 2013

Type: article

Source: Journal of Solid State Electrochemistry

DOI: 10.1007/s10008-013-2216-y

Authors: James Guo Sheng Moo, Zaenal Awaludin, Takeyoshi Okajima, Takeo Ohsaka

Institution: Tokyo Institute of Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2024487591

FWCI: 2.231

Cites: 39

Cited by: 82

Related to: 10