Work

Sputter-Deposited Si Layer for Optical Isolator with Si Guiding Layer

Year: 2009
Type: article
Abstract: An optical isolator with a Si guiding layer that makes use of a nonreciprocal phase shift is discussed. The Si guiding layer was sputter-deposited on a garnet substrate. The magnetooptic waveguide in the optical isolator had an air/Si/magnetic garnet structure. The Si layer deposited on the garnet substrate was analyzed by spectroscopic ellipsometry and X-ray diffraction. A rib waveguide was fabricated on the deposited Si layer and evaluated. The nonreciprocal phase shift in the magnetooptic waveguide was calculated at a wavelength of 1.55 µm. The required thickness of the magnetic-garnet cladding layer was obtained by calculating the nonreciprocal phase shift.
Language: English
Open Access status: bronze
OpenAlex ID: W2024918686
FWCI: 0.773
Cites: 11
Cited by: 5
Related to: 10