Work

Evaluation of the background signal for mass spectrometry under high ambient hydrogen pressures in plasma discharges

Year: 1995

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.579490

Authors: Y. Nakashima, K. Tsuchiya, K. Ohtoshi, M. Shoji, K. Yatsu, T. Tamano

Institutions: University of Tsukuba, Plasma Research Center, University of Tsukuba

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2024947882

FWCI:

Cites:

Cited by: 8

Related to: 1