Work

X-ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al2O3 interfacial chemical compatibility

Year: 1995

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.579676

Authors: J. F. Silvain, J. C. Bihr, M. Alnot, J. Lambert, J. J. Ehrhardt

Institutions: Centre National de la Recherche Scientifique, Université Henri Poincaré

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2025985686

FWCI: 0.925

Cites:

Cited by: 18

Related to: 10