Work

Electron beam nanolithography with image reversal by ECR plasma oxidation

Year: 1995

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/0167-9317(94)00071-2

Authors: K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, K. Murase

Institution: NTT (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2028291675

FWCI: 2.315

Cites: 5

Cited by: 6

Related to: 10