Work

Electrical metrics for lithographic line-end tapering

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.793117

Authors: Puneet Gupta, Kwangok Jeong, Andrew B. Kahng, Chul-Hong Park

Institutions: University of California, Los Angeles, University of California San Diego

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2029068005

FWCI: 3.317

Cites: 9

Cited by: 13

Related to: 10