Work

Rigorous simulation of lithographic exposure of photoresist over a nonplanar wafer

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.530047

Authors: Andreas Erdmann, Christian K. Kalus

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2030894591

FWCI: 0.449

Cites:

Cited by: 1

Related to: 10