Work

Soft UV-NIL at the 12.5 nm scale

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.870524

Authors: G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Nartz, M. Muehlberger, I. Bergmair, M. Boehm, R. Schoeftner

Institutions: EV Group (Austria), IMS Nanofabrication (Austria), PROFACTOR GmbH (Austria)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2032035178

FWCI: 3.976

Cites:

Cited by: 2

Related to: 10