Work

High resolution x-ray masks for high aspect ratio microelectromechanical systems (HARMS)

Year: 2003

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.478268

Authors: Lin Wang, Flavio Aristone, Jost Goettert, Jong Ren Kong, Keith Bradshaw, Todd R. Christenson, Yohannes M. Desta, Yoonyoung Jin

Institutions: Louisiana State University, The University of Texas at Dallas, Sandia National Laboratories California, Sandia National Laboratories

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2033306451

FWCI: 1.296

Cites: 1

Cited by: 4

Related to: 10