Strain relaxation by pitting in AlN thin films deposited by metalorganic chemical vapor deposition
Year: 2013
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.4792694
Institutions: North Carolina State University, HexaTech (United States)
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
Award: G5452002521
OpenAlex ID: W2033417841