Work

Low temperature deposition of microcrystalline silicon germanium Si1‐xGex by RF‐PECVD

Year: 2010

Type: article

Source: Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics

DOI: 10.1002/pssc.200982791

Authors: Abdelkrim Fedala, Claude Simon, Nathalie Coulon, Tayeb Mohammed‐Brahim, Mehena Abdeslam, Ahmed‐Chafik Chami

Institutions: Centre National de la Recherche Scientifique, University of Sciences and Technology Houari Boumediene, Institut d'Électronique et des Technologies du numéRique, Université Rennes 1

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2033508043

FWCI: 0.715

Cites:

Cited by: 10

Related to: 10