Work

Effect of d.c. bias on the deposition rate using r.f.–d.c. coupled magnetron sputtering for SnNx thin films

Year: 2000

Type: article

Source: Vacuum

DOI: 10.1016/s0042-207x(00)00345-6

Authors: R Kamei, T Migita, T Tanaka, K Kawabata

Institution: Hiroshima Institute of Technology

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2033713287

FWCI:

Cites: 5

Cited by: 18

Related to: 10