Drastic improvement of oxide thermoelectric performance using thermal and plasma treatments of the InGaZnO thin films grown by sputtering
Year: 2011
Type: article
Source: Acta Materialia
Institutions: Sungkyunkwan University, Yonsei University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2034420144
