The adsorption and thermal decomposition of formic acid on Si(100) and Si(111) surfaces
Year: 1989
Type: article
Source: The Journal of Chemical Physics
DOI: 10.1063/1.456981
Authors: S. Tanaka, M. Onchi, M. Nishijima
Institution: Kyoto University
Language: English
Subfield: Physical and Theoretical Chemistry
Field: Chemistry
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2034495137