Work

Comparison between ZnO films grown by atomic layer deposition using H2O or O3 as oxidant

Year: 2004

Type: article

Source: Thin Solid Films

DOI: 10.1016/j.tsf.2004.10.015

Authors: Seong Keun Kim, Cheol Seong Hwang, Sang-Hee Ko Park, Sun Jin Yun

Institutions: Seoul National University, Electronics and Telecommunications Research Institute

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2035449306

FWCI: 2.533

Cites: 12

Cited by: 155

Related to: 10