Study of Cu diffusion in an Al–1wt.%Si–0.5wt.%Cu bond pad with an Al–1wt.%Si bond wire attached using scanning electron microscopy
Year: 1998
Type: article
Source: Microelectronics Reliability
Institution: IMEC
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2036717536
