Work

Spatial characterization of Ar–Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy

Year: 2006

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/0963-0252/15/4/024

Authors: N Britun, M Gaillard, L Schwaederlé, Y M Kim, J G Han

Institution: Sungkyunkwan University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2040697409

FWCI: 0.971

Cites: 11

Cited by: 19

Related to: 10