Work

Improvement of a microwave ECR plasma source for the plasma immersion ion implantation and deposition process

Year: 2004

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/0963-0252/13/3/008

Authors: Hongchen Wu, Huafang Zhang, Liping Peng, Yanli Jiang, Guojia Ma

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2040887649

FWCI:

Cites: 7

Cited by: 3

Related to: 10