Formation and disruption of conductive filaments in a HfO2/TiN structure
Year: 2014
Type: article
Source: Nanotechnology
Authors: S Brivio, G Tallarida, E Cianci, S Spiga
Institution: Institute for Microelectronics and Microsystems
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: Fondazione Cariplo
OpenAlex ID: W2041933652