Work

Design and performance of capping layers for EUV multilayer mirrors

Year: 2003
Type: conference-paper
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multilayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.
Language: English
Open Access status: green
OpenAlex ID: W2042123792
FWCI: 4.321
Cites:
Cited by: 41
Related to: 10