Work

TiOx film formation process by reactive sputtering

Year: 1992

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.578270

Authors: A. Kinbara, E. Kusano, S. Baba

Institutions: The University of Tokyo, Nippon Sheet Glass (Japan), Seikei University

Language: English

Topic: Advanced Materials and Semiconductor Technologies

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2043045331

FWCI: 2.47

Cites:

Cited by: 40

Related to: 10