Work

Mask and wafer topography effects in immersion lithography

Year: 2005

Type: conference-paper

Source: Optical Microlithography XVIII

DOI: 10.1117/12.599416

Authors: Andreas Erdmann, Peter Evanschitzky, Peter De Bisschop

Institutions: Fraunhofer Institute for Integrated Systems and Device Technology, IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2043494577

FWCI: 3.299

Cites:

Cited by: 18

Related to: 10