Low-temperature (350 °C) growth of AlGaAs/GaAs laser diode by migration enhanced epitaxy
Year: 1988
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.341211
Authors: M. Asai, F. Sato, H. Imamoto, K. Imanaka, M. Shimura
Institution: Omron (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2043730169
