Atomic-Level Stress Calculation and Two Potentials for Critical Conditions of Deposition Process
Year: 2008
Type: article
Source: Crystal Growth & Design
DOI: 10.1021/cg070584h
Authors: Zheng-Han Hong, Shun-Fa Hwang, Te-Hua Fang
Language: English
Subfield: Mechanics of Materials
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2044285255