Work

Transferring resist microlenses into silicon by reactive ion etching

Year: 1996

Type: article

Source: Optical Engineering

DOI: 10.1117/1.600981

Authors: Martin Eisner, Johannes Schwider

Institution: Friedrich-Alexander-Universität Erlangen-Nürnberg

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2044817469

FWCI: 3.263

Cites:

Cited by: 53

Related to: 10