Plasma oxidation of GaAs
Year: 1976
Type: article
Source: Applied Physics Letters
DOI: 10.1063/1.88872
Authors: R. P. H. Chang, A. K. Sinha
Institution: Northwestern University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2045883155
