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Progress toward a raster multibeam lithography tool

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Year: 2004
Type: article
Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
DOI: 10.1116/1.1645885
Authors: S. T. Coyle, B. Shamoun, M. Yu, J. Maldonado, T. Thomas, D. Holmgren, X. Chen, M. R. Scheinfein, B. DeVore, M. Gesley
Institutions: Applied Materials (United States), Simon Fraser University
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W2045911217
FWCI: 2.279
Cites: 5
Cited by: 18
Related to: 10
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