A parallel alignment device with dynamic force compensation for nanoimprint lithography
Year: 2014
Type: article
Source: Review of Scientific Instruments
DOI: 10.1063/1.4867665
Authors: Weihai Chen, Chong Du, Yunjie Wu, Wenjie Chen, Mei Yuan
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Award: G808070385
OpenAlex ID: W2045995459