Work

Mechanism of high density plasma processes for ion-driven etching of materials

Year: 1999

Type: article

Source: Solid-State Electronics

DOI: 10.1016/s0038-1101(99)00129-x

Authors: J.W. Lee, J.F. Donohue, K.D. Mackenzie, R. Westerman, D. Johnson, S.J. Pearton

Institution: University of Florida

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: U.S. Department of Defense, Multidisciplinary University Research Initiative

OpenAlex ID: W2048296372

FWCI:

Cites: 15

Cited by: 14

Related to: 10