Use of SiO2 nanoparticles as etch mask to generate Si nanorods by reactive ion etch
Year: 2006
Type: article
DOI: 10.1116/1.2172251
Authors: Eih-Zhe Liang, Chao-Jei Huang, Ching-Fuh Lin
Institution: National Taiwan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: National Science Council
OpenAlex ID: W2049335806