Work

Atomic Layer Deposition of Ruthenium in Various Precursors and Oxygen Doses

Year: 2013

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/05013.0165ecst

Authors: Jun Woo Kim, Kyung Sik Son, Byungwoo Kim, Woong Kim, Joon Hyung Shim

Institutions: Korea University, Korea University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation

OpenAlex ID: W2052237028

FWCI: 0.406

Cites:

Cited by: 4

Related to: 10