Work

Dielectric properties of SiOx like films deposited from TMS/O2 mixture in low pressure microwave plasma

Year: 2014

Type: article

Source: Vacuum

DOI: 10.1016/j.vacuum.2014.02.022

Authors: M. Kihel, S. Sahli, A. Zenasni, P. Raynaud, Y. Segui

Institutions: University Frères Mentouri Constantine 1, Laboratoire d'Électronique des Technologies de l'Information, Centre National de la Recherche Scientifique, Université Toulouse III - Paul Sabatier, Laboratoire Plasma et Conversion d'Energie

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2052836271

FWCI: 0.173

Cites: 39

Cited by: 17

Related to: 10