Work

Using segmented models for initial mask perturbation and OPC speedup

Year: 2013

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2027718

Authors: Ayman Hamouda, Mohab Anis, Karim S. Karim

Institutions: University of Waterloo, GlobalFoundries (United States), American University in Cairo

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2054868356

FWCI: 1.218

Cites:

Cited by: 4

Related to: 10