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Ultra Low Contact Resistivities for CMOS Beyond 10-nm Node

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Year: 2013
Type: article
Source: IEEE Electron Device Letters
DOI: 10.1109/led.2013.2257664
Authors: Zhen Zhang, Siyuranga Obasa Koswatta, Stephen W. Bedell, Ashish Baraskar, Michael Guillorn, Sebastian U. Engelmann, Yu Zhu, Jemima Gonsalves, Adam Pyzyna, Marinus Hopstaken, Christian Witt, Li Yang, Fei Liu, Joseph Newbury, Wei Song, Cyril Cabral, Michael Lofaro, Ahmet S. Ozcan, Mark Raymond, Christian Lavoie, Jeffrey W. Sleight, Kenneth P. Rodbell, Paul M. Solomon
Institutions: IBM (United States), IBM Research - Thomas J. Watson Research Center, GlobalFoundries (United States)
Language: English

Topic: Semiconductor materials and interfaces
Subfield: Electronic, Optical and Magnetic Materials
Field: Materials Science
Domain: Physical Sciences

Open Access status: closed

Funder: International Society for Bipolar Disorders
OpenAlex ID: W2056572873
FWCI: 1.639
Cites: 5
Cited by: 55
Related to: 10
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